Information Technology
| Mon 31 Mar 2025
Taipei, April 1 -- Taiwan Patent for hardmask composition, hardmask layer, and method of forming patterns has been issued to Samsung SDI. This invention was developed by Kim Hyejeong, Kim Soohee, Kim Yoona, Park Hyungseok, Yun Huichan, Lee Jaechul, Lee Jonghwa, Jeong Seulgi, Chae Yunju and Hwang Won Jong.
The patent applicati..