Semiconductor
| Sat 24 Oct 2026
Alexandria, Oct. 24 -- ASML Netherlands has been awarded a patent for Methods for Improving Process Based Contour Information of Structure in Image. This invention was developed by Hou Zhenyu, Feng Mu, Wang Jinze, Wang Jen-shiang, Guo Xin, Luo Ya, Zheng Yunan, Chen Jun, Ma Ziyang, Zhang Chenji, Fan Yongfa, Cheng Jin, Chen Feng a..