Semiconductor
| Mon 27 Apr 2026
Alexandria, April 27 -- U.S. Patent and Trademark Office has received ASML Netherlands patent application for Training a Machine Learning Model to Predict Images Representative of Defects on a Substrate. Tao Jun, Feng Mu, Guo Yunbo, Lu Yen-wen, Pu Lingling, Xie Xu, Spence Christopher Alan, Zhang Chenji, Yu Liangjiang, Cao Yu, Ka..