Semiconductor
| Wed 21 Jan 2026
Alexandria, Jan. 21 -- Intel has applied United States patent for Thin Film Transistors Having Etched Contact Metallization. Djieutedjeu Honore, Sharma Abhishek Anil, Le Van H, Hadagali Vinaykumar, Mehta Nikhil, Huang Yu-wen, Desai Umang and Wiegand Christopher J developed it.
The patent application number is US202418754585 202..