Semiconductor
| Wed 13 May 2026
Alexandria, May 14 -- United States Patent for Illumination Source and Associated Metrology Apparatus has been issued to ASML Netherlands. This invention was developed by Jin Wenjie, Smorenburg Petrus Wilhelmus, Lin Nan, Porter Christina Lynn, O'dwyer David, Arnold Cord Louis and Donders Sjoerd Nicolaas Lambertus.
The patent ap..