Semiconductor
| Thu 27 Aug 2026
Geneva, Aug. 27 -- Applied Materials has submitted a patent application for Etch Stop Layer for 3D Memory. Pranatharthiharan Balasubramanian, Seo Jongbeom, Kang Chang Seok, Grant Devika S, Makala Raghuveer Satya, Kitajima Tomohiko, Hao Ruiying, Sung Min Gyu and Chung Hoi Sung developed the invention.
The patent application numb..