Semiconductor
| Sun 11 Jan 2026
Munich, Jan. 12 -- Intel has filed a patent application for Integrated Circuit Structures Having Stress-inducing Gate Cut Plugs. This invention was developed by Chu Tao, Xu Guowei, Chao Robin, Zhang Feng, Hung Ting-hsiang, Lin Chia-ching, Zhang Yang, Zhang Kan, Yeung Chun Wing, Jang Minwoo, Luo Yanbin, Lin Chung-hsun, Murthy Ana..