Semiconductor
| Tue 30 Jun 2026
Alexandria, July 1 -- Resonac has sought patent for Polishing Liquid for CMP, Polishing Liquid Set for CMP, and Polishing Method. This invention was developed by Sakaguchi Junya, Mizutani Makoto, Inoue Keisuke, Sato Kai, Maeda Masanori, Kurata Yasushi, Kuwata Ayaka, Iwano Tomohiro, Kubota Shigeki and Kurata Yuto.
The patent a..