Semiconductor
| Sat 25 Jul 2026
Munich, July 25 -- European Patent Office has released ASML Netherlands patent application for Discharge Damage Mitigation Unit. This invention was developed by Looman Bram Albertus, Ebert Martin, Leeuwenhoek Maarten, Baars Norman Hendrikus Rudolf, Van Aaken Willem Petrus, Bastiaans Koen Mathijs, De Langen Johannes Cornelis Jaco..