Semiconductor
| Thu 21 May 2026
Alexandria, May 22 -- United States Patent for Assembly for Separating Radiation in the Far Field has been issued to ASML Netherlands. This invention was developed by Smorenburg Petrus Wilhelmus, Reinink Johan, Reijnders Marinus Petrus, Nienhuys Han-kwang, O'dwyer David, Roobol Sander Bas, Porter Christina Lynn and Edward Stephe..