Semiconductor
| Mon 08 Jun 2026
Taipei, June 8 -- ASML Netherlands has applied Taiwan patent for Pellicle Membrane. Janssen Paul, Biron Maxime, Donmez Noyan Inci, Ferre Llin Lourdes, Giesbers Adrianus Johannes Maria, Klootwijk Johan Hendrik, Kuntzel Jan Hendrik Willem, Notenboom Arnoud Willem, Rollier Anne-sophie, Van Der Woord Ties Wouter and Van Zwol Pieter-..