Sanitation
| Tue 26 May 2026
Taipei, May 27 -- TMEIC has filed a patent application for Base Material Cleaning Apparatus. This invention was developed by Gotoh Kohsei, Hiramatsu Takahiro, Orita Hiroyuki, Ichinose Akihiro, Namito Nobuyoshi, Yanagimoto Hiroshi, Kuroda Keiji and Mori Rentaro.
The patent application number is TW20240122706 20240619. The pate..