Plastics
| Mon 11 May 2026
Beijing, May 11 -- Anshan Hifichem Co Ltd has applied Chinese patent for Resin Polymer, 1, 4-cyclohexane Dimethyl Diisocyanate with Low Chlorinated Impurity Content and Continuous Preparation Method. Chen Gang, Sun Haibo, Chen Haishuo, Yang Yan, Zhang Sinan, Yan Dandan, Xu Xinyang, Pan Fengliang, Han Dong-jin and Liu Jian develo..