Plastics
| Sat 21 Mar 2026
Beijing, March 21 -- Sun Yat-sen University has sought patent for Negative Photosensitive Polyimide Precursor Resin Composition and Application Thereof. This invention was developed by Zhang Yi, Meng Huifa, Chen Kaijin, Gao Yueshu, Lin Keyi, Zhao Zining, Wu Peixin, Jiang Xing and Liu Siwei.
The patent application number is CN20..