Nanotech
| Thu 25 Jun 2026
Munich, June 26 -- Intel has submitted a patent application for Diffusion Barrier Liner for Nanoribbon Transistor Processing. This invention was developed by Yeung Chun Wing, Luo Yanbin, Lin Chia-ching, Lin Chung-hsun, Chu Tao, Hu Lin, Jang Minwoo, Ghani Tahir, Packan Paul, Xu Guowei, Armstrong Mark, Zhang Yang, Chao Robin, Zhan..