Nanotech
| Tue 25 Aug 2026
Alexandria, Aug. 25 -- IBM has been awarded a patent for Co-integration of Gate-all-around Nanosheet Logic Device and Precision Mol Resistor. This invention was developed by Mukesh Sagarika, Greene Andrew M, Xie Ruilong, Wang Junli, Loubet Nicolas Jean, Chou Anthony I, Frougier Julien, Leobandung Effendi, Zhang Jingyun and Baske..