Chemicals
| Thu 25 Jun 2026
Beijing, June 25 -- Beihua University has sought patent for Shear Rheological Polishing Solution and Production Method Thereof. This invention was developed by Guo Sitong, Zhang Zhanshuo, Lyu Haoze, Wang Jiaqi, Wang Zicheng, Cao Linlin, Ma Zhanshan, Li Mingjun and Sun Yongqiang.
The patent application number is CN202511472113..