Semiconductor
| Fri 26 Apr 2024
Taipei, April 27 -- Lam Res has sought patent for control of metallic contamination from metal-containing photoresist. This invention was developed by Peter Daniel, Tan Samantha Siamhwa, Yu Jengyi, Li Da, Xue Meng, Choi Wook, Kim Ji-Yeon, Jensen Alan J, Labib Shahd Hassan, Lee Young-Hee and Zhao Hong-Xiang.
The patent applica..